Modelling the Influence of the Shot Size Dispersion on the Evolutin of the Residual Stess Profiles vs Time in Shot Peening

Author:  H. Chardin, S. Slim, G. Inglebert
Source:  Conf Proc: ICSP-6, (p.348-355)
Doc ID:  1996083
Year of Publication:  1996
Abstract:  
The influence of peening time on residual stress profiles after shot peening was studied as a consequence of the energy dispersion of shots. An equivalent shot size Oequiv is defined to obtain the same coverage ratio as with the actual shot size distribution. A random approach of covering in shot peening is proposed to define an evolution law for Oequiv vs coverage ratio. Introduction of Oequiv in predictive residual stress models, calculated for different coverage ratios, gives a quantitative evaluation of the residual stress profiles evolution as a function of time, and shot size distribution.