Peening Article with Peening Particles Arranged to Minimize Tracking
Author: Timothy L. Graf
Source: US Patent 5,619,877
Doc ID: 1997021
Year of Publication: 1997
Abstract:
A peening particle support having a plurality of asymmetrically arranged peening particles positioned to minimize tracking on a workpiece. The peening particles are attached to an exposed surface of the peening particle support. The peening particle arrangement includes three or less peening particles with substantially the same non-zero radial distance from a center of the exposed surface. The peening particles are preferably arranged in at least one linear array of peening particles.