Peening Article with Peening Particles Arranged to Minimize Tracking

Author:  Timothy L. Graf
Source:  US Patent 5,619,877
Doc ID:  1997021
Year of Publication:  1997
Abstract:  
A peening particle support having a plurality of asymmetrically arranged peening particles positioned to minimize tracking on a workpiece. The peening particles are attached to an exposed surface of the peening particle support. The peening particle arrangement includes three or less peening particles with substantially the same non-zero radial distance from a center of the exposed surface. The peening particles are preferably arranged in at least one linear array of peening particles.